Company Filing History:
Years Active: 1999-2015
Title: Innovations and Contributions of Stefan Geerte Kruijswijk
Introduction
Stefan Geerte Kruijswijk, a prominent inventor based in Eindhoven, Netherlands, has made significant contributions to the field of lithography with a total of 12 patents to his name. His work primarily focuses on lithographic apparatus and stage systems, showcasing his expertise in advanced technological solutions.
Latest Patents
Kruijswijk's latest patents highlight innovative advancements in lithographic technology. One notable patent describes a **stage system** that includes an object table designed to hold an object, featuring a short stroke actuator element for limited movement and a long stroke actuator element for extended displacement. This system incorporates a pneumatic compensation device with a sensor to measure pneumatic disturbances, effectively enhancing the precision of the actuator's movements.
Another significant patent involves a **lithographic projection apparatus** which comprises a substrate table capable of holding a substrate with an edge feature. This apparatus is equipped with a projection system that projects a patterned beam of radiation onto the substrate. A fluid handling system is integrated to supply liquid flow between the projection system and the substrate, ensuring effective confinement of the liquid in the designated space. The positioner within this system is crucial for optimal substrate alignment concerning the liquid flow.
Career Highlights
Throughout his career, Stefan has worked with prominent companies such as ASML Netherlands B.V. and the U.S. Philips Corporation. His role in these organizations has allowed him to significantly impact the lithography field through various technological advancements and innovations.
Collaborations
Kruijswijk has collaborated with notable colleagues, including Leon Martin Levasier and Arie Jeffrey Den Boef. These partnerships have facilitated the exchange of ideas and enhanced the development of new technologies, further advancing the field of lithography.
Conclusion
Stefan Geerte Kruijswijk's contributions to lithography through his patents and collaborations underscore his position as a leading innovator in the field. His dedication to enhancing lithographic technologies demonstrates the importance of innovation in driving progress and efficiency in industrial applications.