The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2006
Filed:
Dec. 16, 2003
Leon Martin Levasier, Hedel, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Ingo Dirnstorfer, Eindhoven, NL;
Andre Bernardus Jeunink, Bergeyk, NL;
Stefan Geerte Kruijswijk, Eindhoven, NL;
Henricus Petrus Maria Pellemans, Veldhoven, NL;
Irwan Dani Setija, Utrecht, NL;
Hoite Pieter Theodoor Tolsma, Eindhoven, NL;
Leon Martin Levasier, Hedel, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Ingo Dirnstorfer, Eindhoven, NL;
Andre Bernardus Jeunink, Bergeyk, NL;
Stefan Geerte Kruijswijk, Eindhoven, NL;
Henricus Petrus Maria Pellemans, Veldhoven, NL;
Irwan Dani Setija, Utrecht, NL;
Hoite Pieter Theodoor Tolsma, Eindhoven, NL;
ASML, Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus according to one embodiment of the invention includes an alignment subsystem configured to align the substrate on the substrate table relative to the patterning structure. The alignment structure comprises a non-periodic feature which may be detectable as e.g. a capture position or a check position using a reference grating in the alignment subsystem. The non-periodic feature may cause a phase effect in the detected signal of the alignment subsystem or an amplitude effect.