The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2007
Filed:
Dec. 23, 2004
Stefan Geerte Kruijswijk, Eindhoven, NL;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Markus Franciscus Antonius Eurlings, Tilburg, NL;
Heine Melle Mulder, Eindhoven, NL;
Stefan Geerte Kruijswijk, Eindhoven, NL;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Markus Franciscus Antonius Eurlings, Tilburg, NL;
Heine Melle Mulder, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system configured to provide a radiation beam; a patterning device configured to pattern the radiation beam to form a patterned radiation beam; and a projection system configured to project the patterned radiation beam onto a substrate. An optical assembly includes multiple optical elements two-dimensionally arranged between a radiation source and the patterning device to create a predetermined angular distribution of the radiation beam. In order to improve the uniformity of the radiation beam the optical elements are selected from a predetermined number of optical elements having different shapes and/or sizes.