The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2011
Filed:
Mar. 14, 2007
Kars Zeger Troost, Waalre, NL;
Jason Douglas Hintersteiner, Norwalk, CT (US);
Minne Cuperus, Veldhoven, NL;
Kamen Hristov Chilov, Eindhoven, NL;
Richard Carl Zimmerman, Brookfield, CT (US);
Ronnie Florentius Van T Westeinde, Ridgefield, CT (US);
Kars Zeger Troost, Waalre, NL;
Jason Douglas Hintersteiner, Norwalk, CT (US);
Minne Cuperus, Veldhoven, NL;
Kamen Hristov Chilov, Eindhoven, NL;
Richard Carl Zimmerman, Brookfield, CT (US);
Ronnie Florentius Van T Westeinde, Ridgefield, CT (US);
ASML Holding N.V., Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to be formed.