Company Filing History:

15 out of 4,883

Asml Netherlands B.v.

where one patent can have more than one assignee

Years Active: 2008-2019

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15 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10345711 - Substrate placement in immersion lithography (2019-07-09),

2. 9740106 - Substrate placement in immersion lithography (2017-08-22),

3. 9182222 - Substrate placement in immersion lithography (2015-11-10),

4. 8749754 - Lithographic apparatus and device manufacturing method (2014-06-10),

5. 8553201 - Lithographic apparatus and device manufacturing method (2013-10-08),

6. 8441617 - Substrate placement in immersion lithography (2013-05-14),

7. 8077291 - Substrate placement in immersion lithography (2011-12-13),

8. 8059266 - Radiometric Kirk test (2011-11-15),

9. 8009270 - Uniform background radiation in maskless lithography (2011-08-30),

10. 8009269 - Optimal rasterization for maskless lithography (2011-08-30),

11. 7859644 - Lithographic apparatus, immersion projection apparatus and device manufacturing method (2010-12-28),

12. 7671963 - Lithographic apparatus and device manufacturing method (2010-03-02),

13. 7486381 - Lithographic apparatus and device manufacturing method (2009-02-03),

14. 7352440 - Substrate placement in immersion lithography (2008-04-01),

15. 7330238 - Lithographic apparatus, immersion projection apparatus and device manufacturing method (2008-02-12),

Title: The Innovative Mind of Minne Cuperus: Revolutionizing Immersion Lithography.

Introduction:

Minne Cuperus, a visionary inventor based in Veldhoven, Netherlands, has made significant contributions to the field of immersion lithography. With an impressive portfolio of 15 patents, Cuperus is at the forefront of cutting-edge technology in substrate placement methodologies.

Latest Patents:

Cuperus's latest patents showcase his expertise in immersion lithography. One of his notable inventions includes a method for determining the offset between the center of a substrate and a depression in a chuck. This innovative approach involves precise measurements of alignment marks on test substrates, leading to enhanced accuracy in substrate placement processes.

Career Highlights:

During his career, Minne Cuperus has made remarkable strides in the semiconductor industry, particularly through his work at renowned companies such as ASML Netherlands B.V. and ASML Holding N.V. His strategic insights and inventive solutions have been instrumental in advancing immersion lithography technologies, setting new standards for precision and efficiency in manufacturing processes.

Collaborations:

Cuperus has collaborated with esteemed professionals in the field, including Christiaan Alexander Hoogendam and Gerrit Johannes Nijmeijer. These collaborations have not only enriched his innovative projects but have also fostered a culture of knowledge-sharing and excellence within the industry.

Conclusion:

In conclusion, Minne Cuperus stands as a pioneering figure in the realm of immersion lithography, with a proven track record of delivering groundbreaking solutions through his patents and collaborative endeavors. His commitment to pushing the boundaries of technology continues to inspire advancements in semiconductor manufacturing, shaping the future of the industry.

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2 patents (EPO):

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