The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2009
Filed:
May. 21, 2004
Bob Streefkerk, Tilburg, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Minne Cuperus, Veldhoven, NL;
Bob Streefkerk, Tilburg, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Minne Cuperus, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.