The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2010
Filed:
Dec. 17, 2007
Jan-gerard Cornelis Van Der Toorn, Eindhoven, NL;
Hans Butler, Best, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Evert Hendrik Jan Draaijer, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Frits Van Der Meulen, Eindhoven, NL;
Mark Johannes Hermanus Frencken, Ittervoort, NL;
Martijn Houkes, Sittard, NL;
Antonius Henricus Arends, Eindhoven, NL;
Minne Cuperus, Veldhoven, NL;
Jan-Gerard Cornelis Van Der Toorn, Eindhoven, NL;
Hans Butler, Best, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Evert Hendrik Jan Draaijer, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Frits Van Der Meulen, Eindhoven, NL;
Mark Johannes Hermanus Frencken, Ittervoort, NL;
Martijn Houkes, Sittard, NL;
Antonius Henricus Arends, Eindhoven, NL;
Minne Cuperus, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determine a desired position of the fluid supply system based on a position signal to be provided to the substrate stage and a position offset, the position offset added to the position signal to be provided to the substrate stage.