The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2019
Filed:
Aug. 21, 2017
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Christiaan Alexander Hoogendam, Veldhoven, NL;
Gerrit Johannes Nijmeijer, Larchmont, NY (US);
Minne Cuperus, Veldhoven, NL;
Petrus Anton Willem Cornelia Maria Van Eijck, Budel, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01); G01B 11/26 (2006.01); G01B 11/14 (2006.01); G01B 11/27 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01); G01B 11/14 (2013.01); G01B 11/26 (2013.01); G01B 11/272 (2013.01); G03F 7/707 (2013.01); G03F 7/70716 (2013.01); G03F 7/70775 (2013.01); G03F 9/7011 (2013.01);
Abstract
A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.