The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2008
Filed:
Mar. 28, 2005
Jan-gerard Cornelis Van Der Toorn, Eindhoven, NL;
Hans Butler, Best, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Evert Hendrik Jan Draaijer, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Frits Van Der Meulen, Eindhoven, NL;
Mark Johannes Hermanus Frencken, Ittervoort, NL;
Martijn Houkes, Sittard, NL;
Antonius Henricus Arends, Sevenum, NL;
Minne Cuperus, Veldhoven, NL;
Jan-Gerard Cornelis Van Der Toorn, Eindhoven, NL;
Hans Butler, Best, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Evert Hendrik Jan Draaijer, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Frits Van Der Meulen, Eindhoven, NL;
Mark Johannes Hermanus Frencken, Ittervoort, NL;
Martijn Houkes, Sittard, NL;
Antonius Henricus Arends, Sevenum, NL;
Minne Cuperus, Veldhoven, NL;
ASML Netherlands, B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.