Asml Netherlands B.v.

Asml Holding N.v.

Minne Cuperus

Christiaan Alexander Hoogendam

Gerrit Johannes Nijmeijer

Henrikus Herman Marie Cox

Petrus Anton Willem Cornelia Maria Van Eijck

Bob Streefkerk

Jeroen Johannes Sophia Maria Mertens

Koen Jacobus Johannes Maria Zaal

Hans Butler

Nicolaas Ten Kate

Jan-Gerard Cornelis Van Der Toorn

Frits Van Der Meulen

Martijn Houkes

Mark Johannes Hermanus Frencken

Evert Hendrik Jan Draaijer

Antonius Henricus Arends

Patricius Aloysius Jacobus Tinnemans

Heine Melle Mulder

Kars Zeger Troost

Jason Douglas Hintersteiner

Richard Carl Zimmerman

Paul Antoon Cyriel Desmedt

David A Hult

Kamen Hristov Chilov

Petrus Anton Willern Cornelia Maria Van Eijck

Ronnie Florentius Van T Westeinde

Henrikus Herman Cox

Koen Jacobus Johannes M Zaal

A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.

Substrate placement in immersion lithography

An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

Lithographic apparatus and device manufacturing method

Systems and methods for measuring stray light in a lithographic apparatus are described using Radiometric Kirk Test (also known as Scanning SAMOS Test). The Radiometric Kirk Test of the present invention involves a test pattern having an isolated dark area within a much larger bright field. The radiometric Kirk test includes at least two continuous or stepped scans of an aperture of a detector in an image plane of a lithographic system. During a dark area measurement, the aperture of the detector is positioned such that at least at one point the aperture of the detector is centered within an image of the dark area. During a bright area measurement, the aperture of the detector is positioned within the image of the bright field. The integrated detector signal is correspondingly computed for the dark area measurement and the bright area measurement. The ratio of the integrated dark area measurement result and integrated bright area measurement result is a measure of stray light present in the lithographic apparatus.

Radiometric Kirk test

A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to be formed.

Optimal rasterization for maskless lithography

A device manufacturing method comprising applying patterns to a plurality of arrays of individually controllable elements, such that they modulate a beam of radiation, and projecting the modulated beam of radiation onto a substrate. The patterns applied to the arrays of individually controllable elements are arranged such that pre-determined amounts of background radiation are included in the modulated beam of radiation. The pre-determined amounts of background radiation being different for different locations on the arrays.

Uniform background radiation in maskless lithography

A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determine a desired position of the fluid supply system based on a position signal to be provided to the substrate stage and a position offset, the position offset added to the position signal to be provided to the substrate stage.

Lithographic apparatus, immersion projection apparatus and device manufacturing method

A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.

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Veldhoven, Netherlands

Minne Cuperus