The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
May. 04, 2006
Applicants:
Kars Zeger Troost, Waalre, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
James Sherwood Greeneich, Prescott, AZ (US);
Inventors:
Kars Zeger Troost, Waalre, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
James Sherwood Greeneich, Prescott, AZ (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/42 (2006.01); G02B 27/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithographic apparatus including an exposure unit that exposes parallel lines on a target area of a substrate by projecting two beams of radiation onto the substrate. The two beams of radiation are projected such that they interfere with each other to form the parallel lines. An actuator continuously moves the substrate relative to the exposure unit, while the exposure unit exposes the parallel lines on the target areas on the substrate.