The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2009

Filed:

Jan. 22, 2007
Applicants:

Arno Jan Bleeker, Westerhoven, NL;

Donis George Flagello, Scotttsdale, AZ (US);

Robert John Socha, Campbell, CA (US);

James Sherwood Greeneich, Prescott, AZ (US);

Kars Zeger Troost, Waalre, NL;

Inventors:

Arno Jan Bleeker, Westerhoven, NL;

Donis George Flagello, Scotttsdale, AZ (US);

Robert John Socha, Campbell, CA (US);

James Sherwood Greeneich, Prescott, AZ (US);

Kars Zeger Troost, Waalre, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/72 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination profile for a second area of the pattern layout; switching illumination profile during transfer of the image of the pattern layout such that the first area of the pattern layout is illuminated with the first illumination profile and the second area is illuminated with the second illumination profile; and projecting an image of the illuminated first and second areas onto the surface of the substrate.


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