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For the Inventor, By the Inventor

Scottsdale, AZ, United States of America

Donis George Flagello

This inventor holds 29 USPTO granted patents and 3 published patent applications and 1 EPO patent, primarily in EUV Lithography. Top assignees: Asml Netherlands B.v., Nikon Corporation, Asml Masktools B.v.. Active years: 2005-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Donis George Flagello. Retrieved from https://idiyas.com/inventor/donis-george-flagello

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 29 

% Patents Active = 58.6


Average Co-Inventor Count = 2.3

ph-index = 8

Forward Citations = 414(Granted Patents)


Location History:

  • Scotttsdale, AZ (US) (2009)
  • Scottsdale, AZ (US) (2005 - 2018)
  • Half Moon Bay, CA (US) (2015 - 2022)

Company Filing History:

goldMedal15 out of 5,070 
 
Asml Netherlands B.v.
 patents
silverMedal9 out of 8,994 
 
Nikon Corporation
 patents
bronzeMedal3 out of 87 
 
Asml Masktools B.v.
 patents
4. 2 out of 629 
 
Asml Holding N.v.
 patents
5. 1 out of 461 
 
Carl-Zeiss-Smt Ag
 patents
where one patent can have more than one assignee

Years Active: 2005-2025

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Areas of Expertise:
Curved Reticle
EUV Exposure Tool
Dynamic Patterning
Lithographic Substrate
Photoresist Model
Numerical Aperture
Polarization Illumination
Double Exposure
Gradient Immersion
Illumination Simulator
Device Manufacturing
Pattern Fidelity
29 patents (USPTO):Explore Patents
1. 12346029 - Curved reticle by mechanical and phase bending along orthogonal axes (2025-07-01),
2. 11300884 - Illumination system with curved 1d-patterned mask for use in EUV-exposure tool (2022-04-12),
3. 11099483 - Euv lithography system for dense line patterning (2021-08-24),
4. 10890849 - EUV lithography system for dense line patterning (2021-01-12),
5. 10310387 - Dynamic patterning method that removes phase conflicts and improves pattern fidelity and CDU on a two phase-pixelated digital scanner (2019-06-04),
6. 10133184 - Using customized lens pupil optimization to enhance lithographic imaging in a source-mask optimization scheme (2018-11-20),
7. 9366952 - Lithographic substrate and a device (2016-06-14),
8. 9091941 - Fast illumination simulator based on a calibrated flexible point-spread function (2015-07-28),
9. 9086633 - Lithographic method (2015-07-21),
10. 8910093 - Fast photoresist model (2014-12-09),
11. 8588508 - Method or matching high-numerical aperture scanners (2013-11-19),
12. 8395757 - Optimized polarization illumination (2013-03-12),
13. 8252487 - Device manufacturing method and mask for use therein (2012-08-28),
14. 7952803 - Lithographic apparatus and device manufacturing method (2011-05-31),
15. 7710544 - Optimized polarization illumination (2010-05-04),

Title: The Innovative Journey of Donis George Flagello

Introduction: Donis George Flagello, a talented inventor based in Scottsdale, AZ, has made significant contributions to the world of innovation with his creative mind and dedication to problem-solving.

Latest Patents: Donis George Flagello holds several patents in various fields, including technology, healthcare, and consumer products. His recent patents focus on improving efficiency in everyday tasks and enhancing user experiences.

Career Highlights: Throughout his career, Donis George Flagello has demonstrated a keen ability to identify gaps in the market and develop innovative solutions to address them. His groundbreaking inventions have earned him recognition as a pioneer in the industry.

Collaborations: Donis George Flagello has collaborated with leading companies and research institutions to bring his inventions to life. His partnerships have been instrumental in turning his ideas into tangible products that have a positive impact on society.

Conclusion: Donis George Flagello's passion for innovation and commitment to excellence continue to drive his success as an inventor. His relentless pursuit of new ideas and collaborations ensures that his legacy of groundbreaking inventions will inspire future generations of innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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