The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2015
Filed:
May. 11, 2009
Applicant:
Donis George Flagello, Scottsdale, AZ (US);
Inventor:
Donis George Flagello, Scottsdale, AZ (US);
Assignee:
ASML HOLDING N.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3105 (2006.01); H01L 21/312 (2006.01); G03F 7/40 (2006.01); G03F 7/095 (2006.01); G03F 7/12 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/405 (2013.01); G03F 7/095 (2013.01); G03F 7/12 (2013.01); G03F 7/70325 (2013.01); Y10T 428/24802 (2013.01);
Abstract
A lithographic method is disclosed that includes, on a substrate provided with a layer of a resist and a further layer of a material provided on the layer of resist, providing a pattern in the further layer, the pattern defining a space via which an area of the layer of resist may be exposed to radiation, a distance between features of the pattern defining the space, and exposing the layer of resist to radiation having a wavelength greater than the distance between features of the pattern defining the space, such that near-field radiation is generated which propagates into and exposes an area of the resist.