The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2019
Filed:
Jun. 12, 2018
Applicant:
Nikon Corporation, Tokyo, JP;
Inventors:
Shane R. Palmer, Oro Valley, AZ (US);
Julia A. Sakamoto, Tucson, AZ (US);
Donis G. Flagello, Half Moon Bay, CA (US);
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70466 (2013.01); G03F 7/70283 (2013.01); G03F 7/70291 (2013.01); G03F 7/70483 (2013.01);
Abstract
Phase conflicts in pattern transfer with phase masks can be resolve by exposing pattern features with a first pattern and a second pattern, wherein the second pattern is selected based on the phase conflicts. In scanned exposures using pulsed lasers, a number of exposures of the second pattern can be less than 20% of a total number of exposures.
Quick Actions:
Palmer, Shane. (2019). Dynamic patterning method that removes phase conflicts and improves pattern fidelity and cdu on a two phase-pixelated digital scanner (U.S. Patent No. 10310387). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10310387
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile