The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2015
Filed:
Dec. 05, 2008
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Christian Wagner, Eersel, NL;
Rogier Hendrikus Magdalena Cortie, Ittervoort, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Christian Wagner, Eersel, NL;
Rogier Hendrikus Magdalena Cortie, Ittervoort, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a liquid supply system configured to supply an immersion liquid between a downstream optical element of a projection system of the lithographic apparatus and the substrate, and a control system which is arranged to drive the substrate table so as to perform an acceleration profile to accelerate the substrate table from a first velocity in a first direction to a second velocity in a second direction. The acceleration profile is asymmetric in time and is dimensioned so that when the substrate table is accelerated according to the acceleration profile, a force to break a meniscus of the immersion liquid remains lower than a force to maintain the meniscus of the immersion liquid.