The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2008
Filed:
Apr. 08, 2005
Applicants:
Christian Wagner, Eersel, NL;
Wilhelmus Petrus DE Boeij, Veldhoven, NL;
Roel DE Jonge, Veldhoven, NL;
Tilmann Heil, Aalen, DE;
Damian Fiolka, Oberkochen, DE;
Inventors:
Christian Wagner, Eersel, NL;
Wilhelmus Petrus De Boeij, Veldhoven, NL;
Roel De Jonge, Veldhoven, NL;
Tilmann Heil, Aalen, DE;
Damian Fiolka, Oberkochen, DE;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/72 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.