The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2010
Filed:
Aug. 31, 2004
Lithographic apparatus, device manufacturing method, calibration method and computer program product
Applicants:
Hans Van Der Laan, Veldhoven, NL;
Christian Wagner, Eersel, NL;
Inventors:
Hans Van Der Laan, Veldhoven, NL;
Christian Wagner, Eersel, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 9/00 (2006.01); G03B 27/32 (2006.01); G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
To calibrate a lithographic apparatus contrast in the aerial image is measured for a plurality of different settings of available manipulators of the projection system. Appropriate settings of the manipulators are determined as those giving the maximum contrast values.
Van Der Laan, Hans. (2010). Lithographic apparatus, device manufacturing method, calibration method and computer program product (U.S. Patent No. 7663741). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7663741
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile