The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2009
Filed:
Aug. 10, 2004
Gerhard Fuerter, Ellwangen, DE;
Christian Wagner, Eersel, NL;
Uwe Goedecke, Abtsgmuend, DE;
Henriette Mueller, Aalen, DE;
Gerhard Fuerter, Ellwangen, DE;
Christian Wagner, Eersel, NL;
Uwe Goedecke, Abtsgmuend, DE;
Henriette Mueller, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A projection exposure system for microlithography includes an illuminating system (), a reflective reticle () and reduction objectives (). In the reduction objective (), a first beam splitter cube () is provided which superposes the illuminating beam path () and the imaging beam path (). In order to obtain an almost telecentric entry at the reticle, optical elements () are provided between beam splitter cube () and the reflective reticle (). Advantageously, the reduction objective is a catadioptric objective having a beam splitter cube () whose fourth unused side can be used for coupling in light. The illuminating beam path () can also be coupled in with a non-parallel beam splitter plate. The illuminating beam path is refractively corrected in passthrough to compensate for aberrations via the special configuration of the rear side of the beam splitter plate. Advantageously, a beam splitter plate of this kind is used within a reduction objective in lieu of a deflecting mirror and only refractive components are introduced between the beam splitter plate and the reflective reticle.