Henriette Mueller

Title: Henriette Mueller: Innovator in Microlithography

Introduction

Henriette Mueller is a prominent inventor based in Aalen, Germany. She has made significant contributions to the field of microlithography, particularly through her innovative patent. Her work has implications for the advancement of projection exposure systems, which are crucial in the manufacturing of microelectronic devices.

Latest Patents

Henriette holds a patent for a "Projection exposure system having a reflective reticle." This system includes an illuminating system, a reflective reticle, and reduction objectives. The design features a first beam splitter cube that superposes the illuminating beam path and the imaging beam path. To achieve an almost telecentric entry at the reticle, optical elements are strategically placed between the beam splitter cube and the reflective reticle. The reduction objective is a catadioptric objective that utilizes a beam splitter cube, allowing for efficient light coupling. This innovative approach also includes refractive corrections to compensate for aberrations, enhancing the overall performance of the system.

Career Highlights

Henriette Mueller has established herself as a key figure in her field through her work at Carl Zeiss SMT AG. Her expertise in microlithography and optical systems has positioned her as a valuable asset to the company. With her innovative mindset, she continues to push the boundaries of technology in her area of specialization.

Collaborations

Henriette has collaborated with notable colleagues, including Gerhard Fuerter and Christian Wagner. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Henriette Mueller's contributions to microlithography through her patent demonstrate her commitment to advancing technology in this critical field. Her work not only showcases her inventive spirit but also highlights the importance of collaboration in driving innovation forward.