Inventors with similar research interests:
Location History:
- Beverly, MA (US) (2010)
- Peabody, MA (US) (2008 - 2012)
- Shenectady, NY (US) (2015)
- Schenectady, NY (US) (2012 - 2019)
- Albany, NY (US) (2020 - 2023)
Company Filing History:
Years Active: 2008-2025
Title: Akiteru Ko: Innovator in Microelectronics with 54 Patents
Introduction
Akiteru Ko is a prolific inventor based in Schenectady, NY, known for his significant contributions to the field of microelectronics. With a remarkable portfolio of 54 patents, Ko has demonstrated a commitment to advancing technologies that enhance the manufacturing and performance of electronic devices. His innovative methodologies have positioned him at the forefront of the industry.
Latest Patents
Among his latest innovations, Akiteru Ko has developed a patent titled "Method for pitch split patterning using sidewall image transfer". This method entails forming a hard mask layer over a substrate, followed by the application of an anti-reflective coating layer. The process includes creating a patterned resist layer that serves to etch a mandrel from the anti-reflective coating. By forming a sidewall spacer on this mandrel and subsequently creating a freestanding spacer, Ko's technique allows for precise patterning of the underlying substrate layer.
Another notable patent is the "Method and system for capping of cores for self-aligned multiple patterning". This process focuses on applying capping layers to cores before spacer formation in self-aligned multiple patterning (SAMP) processes. The use of a plasma process to deposit a capping layer ensures that core profiles maintain protective caps, reducing material loss during subsequent processes. This innovation aims to achieve a vertical spacer profile with sidewalls exhibiting an angle of 80-90 degrees, enhancing the effectiveness of microelectronic workpiece fabrication.
Career Highlights
Akiteru Ko has worked with leading companies in the microelectronics sector, including Tokyo Electron Limited. His experience in these esteemed organizations has contributed to his development of cutting-edge technologies and methods that are widely recognized within the industry.
Collaborations
Throughout his career, Ko has had the opportunity to collaborate with notable professionals such as Angelique Denise Raley and Eric Chih-Fang Liu. These partnerships have fostered innovation and have played a crucial role in achieving breakthroughs in the microelectronics domain.
Conclusion
Akiteru Ko's impressive array of patents and his innovative spirit underscore his invaluable contributions to microelectronics. With each advancement, he continues to shape the future of technology, exemplifying the essence of dedication and creativity in engineering. His work stands as an inspiration to aspiring inventors and established professionals alike.
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