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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12332568 B1

PDFFull Text
Date of Patent:
Jun. 17, 2025

Filed:

Aug. 03, 2022

Metal oxide resists for euv patterning and methods for developing the same

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Hamed Hajibabaeinajafabadi, Albany, NY (US);

Akiteru Ko, Albany, NY (US);

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorney:

Slater Matsil, LLP

Primary Examiner:

Jiong-Ping Lu

Int. Cl.
CPC ...
G03F 7/38 (2006.01); G03F 7/004 (2006.01); G03F 7/36 (2006.01); G03F 7/40 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01); H01L 21/3065 (2006.01); H01L 21/308 (2006.01); H01L 21/311 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
G03F 7/38 (2013.01); G03F 7/0042 (2013.01); G03F 7/0043 (2013.01); G03F 7/36 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01); H01L 21/0337 (2013.01); H01L 21/3065 (2013.01); H01L 21/308 (2013.01); H01L 21/31122 (2013.01); H01L 21/31144 (2013.01); H01L 21/76898 (2013.01);
Abstract

A method for processing a substrate includes forming a metal oxide resist over the substrate, exposing the metal oxide resist to an extreme ultraviolet light pattern, and flowing a selective gas over the metal oxide resist. The selective gas increases a selectivity of the exposed metal oxide resist to a developing gas. The method further includes flowing the developing gas over the metal oxide resist in a processing chamber and etching the substrate using remaining portions of the metal oxide resist as a mask.

Find Patent Forward Citations

Hajibabaeinajafabadi, Hamed. (2025). Metal oxide resists for euv patterning and methods for developing the same (U.S. Patent No. 12332568). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12332568

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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