The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2026
Filed:
Jul. 22, 2022
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Hamed Hajibabaeinajafabadi, Albany, NY (US);
Akiteru Ko, Albany, NY (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01); G03F 7/42 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0043 (2013.01); G03F 7/325 (2013.01); G03F 7/40 (2013.01); G03F 7/426 (2013.01);
Abstract
A method of reactive developing a metal oxide resist includes providing a gaseous weak acid to a surface of a patterned metal oxide resist including an exposed portion and an unexposed portion, the gaseous weak acid having an acidity (pK) greater than −2 and less than about 20, and reactive developing the patterned metal oxide resist using a selective acid-base reaction between the gaseous weak acid and the patterned metal oxide resist to form volatile products. The gaseous weak acid acts as the acid and either the exposed portion or the unexposed portion acts as the base.