The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2026

Filed:

Feb. 16, 2024
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Sergey Voronin, Albany, NY (US);

Carl Smith, Albany, NY (US);

Nicholas Smieszek, Albany, NY (US);

Qi Wang, Albany, NY (US);

Akiteru Ko, Albany, NY (US);

James Grootegoed, Albany, NY (US);

Norman Jacobson, Albany, NY (US);

Ronald Nasman, Albany, NY (US);

Cheryl Alix, Albany, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/22 (2006.01); H01J 37/32 (2006.01); H10P 72/00 (2026.01); H10P 74/00 (2026.01);
U.S. Cl.
CPC ...
G01N 27/22 (2013.01); H01J 37/32935 (2013.01); H10P 72/0604 (2026.01); H10P 74/23 (2026.01); H01J 37/3211 (2013.01); H01J 2237/24564 (2013.01);
Abstract

An apparatus for plasma measurement includes an electrode within a remote capacitive sensor, a capacitor within the remote capacitive sensor, and a capillary array disposed within a top surface of the remote capacitive sensor. The capacitor is coupled with the electrode. The capillary array is configured to allow charged particles to pass through the capillary array and charge the capacitor.


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