Osaka, Japan

Akihiko Ishibashi

USPTO Granted Patents = 69 

 

Average Co-Inventor Count = 4.7

ph-index = 14

Forward Citations = 621(Granted Patents)


Inventors with similar research interests:


Location History:

  • Osaka-fu, JP (2005)
  • Sakai, JP (1996 - 2008)
  • Mishima-gun, JP (2007 - 2012)
  • Toyama, JP (2015)
  • Osaka, JP (1999 - 2023)

Company Filing History:


Years Active: 1996-2023

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69 patents (USPTO):Explore Patents

As an assistant specialized in innovations, inventions, inventors, patent attorneys, assignees, and patents, I'm here to assist you on your request regarding inventor Akihiko Ishibashi's remarkable contributions to the world of technology and innovation. Akihiko Ishibashi, based in Osaka, JP, has obtained an impressive 69 patents throughout his career, showcasing his dedication to pioneering advancements in the field.

Latest Patents:

1. **ScAlMgO4 Monocrystalline Substrate:** A groundbreaking invention, this monocrystalline substrate demonstrates high cleavability and minimizes cracking in the GaN film grown on it. The substrate boasts a crystal oxygen concentration of 57 atom % or less, as confirmed by inductively coupled plasma atomic emission spectroscopy analysis.

2. **General Formula RAMO Substrate:** Another significant patent by Akihiko Ishibashi, this substrate is designed to resist cracking during and after the formation of group III nitride crystal. With specific characteristics such as a curvature radius r of 52 m or more and a correlation coefficient ρ of 0.81 or more, this innovation illustrates Ishibashi's ingenuity.

Career Highlights:

Having worked at Matsushita Electric Industrial Co., Ltd. and Panasonic Corporation, Akihiko Ishibashi has left a lasting impact on the technological landscape. His relentless pursuit of innovation and commitment to excellence have established him as a visionary in the industry.

Collaborations:

Throughout his career, Akihiko Ishibashi has collaborated with esteemed professionals such as Isao Kidoguchi and Yoshiaki Hasegawa. These partnerships have contributed to the development of groundbreaking technologies and inventions, further solidifying Ishibashi's reputation as an esteemed inventor.

In conclusion, Akihiko Ishibashi's remarkable journey in the world of innovation exemplifies his unwavering dedication to pushing the boundaries of technology. His pioneering spirit and commitment to excellence continue to inspire future generations of inventors and innovators worldwide.

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