The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2015

Filed:

Apr. 04, 2013
Applicant:

Panasonic Corporation, Osaka, JP;

Inventors:

Yasutoshi Kawaguchi, Toyama, JP;

Toshitaka Shimamoto, Osaka, JP;

Akihiko Ishibashi, Toyama, JP;

Isao Kidoguchi, Hyogo, JP;

Toshiya Yokogawa, Nara, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/32 (2006.01); B82Y 20/00 (2011.01); H01L 33/32 (2010.01); H01S 5/343 (2006.01); H01L 33/04 (2010.01); H01L 33/14 (2010.01); H01S 5/20 (2006.01); H01S 5/22 (2006.01); H01S 5/30 (2006.01); H01L 33/02 (2010.01);
U.S. Cl.
CPC ...
H01S 5/3215 (2013.01); B82Y 20/00 (2013.01); H01L 33/14 (2013.01); H01L 33/32 (2013.01); H01S 5/2009 (2013.01); H01S 5/22 (2013.01); H01S 5/2214 (2013.01); H01S 5/3054 (2013.01); H01S 5/3063 (2013.01); H01S 5/3072 (2013.01); H01S 5/3077 (2013.01); H01S 5/3213 (2013.01); H01S 5/3216 (2013.01); H01S 5/34333 (2013.01); H01S 2304/04 (2013.01); H01L 33/025 (2013.01); H01L 33/04 (2013.01);
Abstract

A nitride semiconductor device according to the present invention includes a p-type nitride semiconductor layer, an n-type nitride semiconductor layer, and an active layer interposed between the p-type nitride semiconductor layer and the n-type nitride semiconductor layer. The p-type nitride semiconductor layer includes: a first p-type nitride semiconductor layer containing Al and Mg; and a second p-type nitride semiconductor layer containing Mg. The first p-type nitride semiconductor layer is located between the active layer and the second p-type nitride semiconductor layer, and the second p-type nitride semiconductor layer has a greater band gap than a band gap of the first p-type nitride semiconductor layer.


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