For the Inventor, By the Inventor

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Rehovot, Israel

Nova Measuring Instruments Ltd.

USPTO Granted Patents = 191

% Expired Patents = 13.1

EPO Patents = 13

Trademarks = 8

Forward Citations = 1,762

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112 inventors (with patents filed for the assignee):

Moshe Finarov (78 out of 88 patents)

Boaz Brill (37 out of 39 patents)

Gilad Barak (23 out of 53 patents)

4. Yoel Cohen (21 out of 36 patents)

5. David Scheiner (20 out of 20 patents)

6. Heath A Pois (17 out of 24 patents)

7. David Allen Reed (16 out of 28 patents)

8. Wei Ti Lee (14 out of 38 patents)

9. Bruno W Schueler (13 out of 27 patents)

10. Dror Shafir (12 out of 18 patents)

11. Rodney C Smedt (12 out of 32 patents)

12. Cornel Bozdog (11 out of 16 patents)

13. Yanir Hainick (10 out of 21 patents)

14. Vladimir Machavariani (10 out of 15 patents)

15. Giora Dishon (10 out of 15 patents)

Core Competencies:

X-ray Reflectance

Optical Metrology

Thin Layers

Scatterometry

Semiconductor Manufacturing

XPS Technologies

Surface Analysis

Defect Detection

Mass Spectrometry

Process Control

Patterned Structures

Periodic Structures

191 patents: Sort by Forward Citations

1. 12749642 - Patterned X-ray emitting target (2026-09-29),

2. 12656279 - Production solutions for high-throughput/precision XPS metrology using unsupervised machine learning (2026-06-16),

3. 12637782 - In-situ fingerprinting for electrochemical deposition and/or electrochemical etching (2026-05-26),

4. 12360063 - System and method for measuring a sample by x-ray reflectance scatterometry (2025-07-15),

5. 12281893 - Characterizing and measuring in small boxes using XPS with multiple measurements (2025-04-21),

6. 12165863 - Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry (2024-12-10),

7. 12158437 - XPS metrology for process control in selective deposition (2024-12-03),

8. 12066391 - Method and system for non-destructive metrology of thin layers (2024-08-20),

9. 11996259 - Patterned x-ray emitting target (2024-05-28),

10. 11988502 - Characterizing and measuring in small boxes using XPS with multiple measurements (2024-05-21),

11. 11874237 - System and method for measuring a sample by x-ray reflectance scatterometry (2024-01-16),

12. 11852467 - Method and system for monitoring deposition process (2023-12-26),

13. 11823883 - Mass spectrometer detector and system and method using the same (2023-11-21),

14. 11764050 - Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry (2023-09-19),

15. 11733035 - Feed-forward of multi-layer and multi-process information using XPS and XRF technologies (2023-08-22),

Company Overview

Nova Measuring Instruments Ltd. is a leading provider of advanced metrology solutions for the semiconductor industry, headquartered in Rehovot, Israel. The company specializes in developing and manufacturing innovative technologies such as X-ray reflectance, optical metrology, and scatterometry, which are essential for precise measurement and analysis of thin layers in semiconductor manufacturing. Nova's expertise extends to surface analysis and defect detection, enabling manufacturers to enhance yield and performance in their production processes.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

191 Patents

#4 in Rehovot

#27 in Israel

#4,407 in the World

Rehovot, Israel

Nova Measuring Instruments Ltd.

Forward Citations = 1,762

112 inventors:

Moshe Finarov (78 out of 88 patents)

Boaz Brill (37 out of 39 patents)

Gilad Barak (23 out of 53 patents)

4. Yoel Cohen (21 out of 36 patents)

5. David Scheiner (20 out of 20 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Nova Measuring Instruments Ltd.. Retrieved from https://idiyas.com/company/nova-measuring-instruments

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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