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Rehovot, Israel

Nova Measuring Instruments Ltd.

USPTO Granted Patents = 188

EPO Patents = 10

Trademarks = 17

Forward Citations = 1,745

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111 inventors (with patents filed for the assignee):

Moshe Finarov (78 out of 87 patents)

Boaz Brill (37 out of 39 patents)

Gilad Barak (23 out of 51 patents)

4. Yoel Cohen (21 out of 36 patents)

5. David Scheiner (20 out of 20 patents)

6. Heath A Pois (16 out of 23 patents)

7. David Allen Reed (15 out of 27 patents)

8. Wei Ti Lee (14 out of 37 patents)

9. Dror Shafir (12 out of 17 patents)

10. Bruno W Schueler (12 out of 26 patents)

11. Rodney C Smedt (12 out of 31 patents)

12. Cornel Bozdog (11 out of 15 patents)

13. Yanir Hainick (10 out of 21 patents)

14. Vladimir Machavariani (10 out of 15 patents)

15. Giora Dishon (10 out of 15 patents)

188 patents: Sort by Forward Citations

1. 12360063 - System and method for measuring a sample by x-ray reflectance scatterometry (2025-07-15),

2. 12281893 - Characterizing and measuring in small boxes using XPS with multiple measurements (2025-04-21),

3. 12165863 - Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry (2024-12-10),

4. 12158437 - XPS metrology for process control in selective deposition (2024-12-03),

5. 12066391 - Method and system for non-destructive metrology of thin layers (2024-08-20),

6. 11996259 - Patterned x-ray emitting target (2024-05-28),

7. 11988502 - Characterizing and measuring in small boxes using XPS with multiple measurements (2024-05-21),

8. 11874237 - System and method for measuring a sample by x-ray reflectance scatterometry (2024-01-16),

9. 11852467 - Method and system for monitoring deposition process (2023-12-26),

10. 11823883 - Mass spectrometer detector and system and method using the same (2023-11-21),

11. 11764050 - Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry (2023-09-19),

12. 11733035 - Feed-forward of multi-layer and multi-process information using XPS and XRF technologies (2023-08-22),

13. 11680915 - XPS metrology for process control in selective deposition (2023-06-20),

14. 11668663 - Method and system for non-destructive metrology of thin layers (2023-06-06),

15. 11430647 - Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (2022-08-30),

NOVA MEASURING INSTRUMENTS LTD. is a global leader in optical metrology solutions for the semiconductor industry. With over 25 years of experience, NOVA offers advanced integrated and stand-alone metrology platforms for process control throughout the semiconductor manufacturing process. Their solutions help customers optimize yields, enhance process stability, and improve overall performance. Visit their website for more information.

This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Dec 2 2025

188 Patents

#3 in Rehovot

#25 in Israel

#4,337 in the World

Rehovot, Israel

Nova Measuring Instruments Ltd.

Forward Citations = 1,745

111 inventors:

Moshe Finarov (78 out of 87 patents)

Boaz Brill (37 out of 39 patents)

Gilad Barak (23 out of 51 patents)

4. Yoel Cohen (21 out of 36 patents)

5. David Scheiner (20 out of 20 patents)

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