The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2025
Filed:
Jan. 15, 2024
Applicant:
Nova Measuring Instruments Inc., Freemont, CA (US);
Inventors:
Heath Pois, Fremont, CA (US);
David A. Reed, Belmont, CA (US);
Bruno W. Schueler, San Jose, CA (US);
Rodney Smedt, Los Gatos, CA (US);
Jeffrey Fanton, Los Altos, CA (US);
Assignee:
NOVA MEASURING INSTRUMENTS INC., Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/201 (2018.01); G01N 23/207 (2018.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01N 23/201 (2013.01); G01N 23/207 (2013.01); G01N 2223/054 (2013.01); H01L 22/12 (2013.01);
Abstract
A system and method for measuring a sample by X-ray reflectance scatterometry. The method may include impinging an incident X-ray beam on a sample having a periodic structure to generate a scattered X-ray beam, the incident X-ray beam simultaneously providing a plurality of incident angles and a plurality of azimuthal angles; and collecting at least a portion of the scattered X-ray beam.