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Years Active: 2002-2025
Title: Innovations in Semiconductor Metrology: The Contributions of Rodney C. Smedt
Introduction
Rodney C. Smedt is a distinguished inventor based in Los Gatos, California, known for his significant contributions to the fields of semiconductor metrology and surface analysis. With over 30 patents to his name, Smedt has been instrumental in advancing the technology that underpins the semiconductor industry.
Latest Patents
Among his recent innovations are two notable patents. The first is titled "Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry." This patent describes a sophisticated system that incorporates a secondary ion mass spectrometry (SIMS) setup. This system features a primary ion beam directed at a sample stage and includes an extraction lens configured for low extraction fields for secondary ions emitted from the sample, coupled with a magnetic sector spectrograph for advanced analysis.
The second patent focuses on "System and method for measuring a sample by X-ray reflectance scatterometry." This method enables precise measurement of samples with periodic structures by using an X-ray beam that provides multiple incident and azimuthal angles, allowing for comprehensive data collection from scattered X-rays.
Career Highlights
Rodney Smedt has had an impressive career, contributing to significant advancements in semiconductor technology. He has worked with leading companies such as Nova Measuring Instruments and KLA-Tencor Technologies Corporation, where he applied his expertise in metrology and analytical techniques to propel innovations in semiconductor production and quality assurance.
Collaborations
Throughout his career, Smedt has collaborated with other talented professionals in the field. Notable coworkers include David Allen Reed and Bruno W. Schueler, with whom he has shared insights and developments that have furthered the understanding and application of semiconductor metrology techniques.
Conclusion
Rodney C. Smedt’s contributions to the semiconductor industry through his innovative patents and collaborative efforts mark him as a leading figure in the realm of metrology and surface analysis. His work continues to influence both academic research and industrial practices, ensuring that the semiconductor industry remains at the forefront of technological advancement.