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For the Inventor, By the Inventor

San Jose, CA, United States of America

Bruno W Schueler

This inventor holds 27 USPTO granted patents and 4 published patent applications and 5 EPO patents, primarily in Semiconductor Metrology. Top assignees: Nova Measuring Instruments Ltd., Revera, Incorporated, Revara, Incorporated. Active years: 1997-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bruno W Schueler. Retrieved from https://idiyas.com/inventor/bruno-w-schueler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 27 

% Patents Active = 96.3

 

Average Co-Inventor Count = 3.5

ph-index = 6

Forward Citations = 126(Granted Patents)


Company Filing History:

goldMedal13 out of 191 
 
Nova Measuring Instruments Ltd.
 patents
silverMedal12 out of 21 
 
Revera, Incorporated
 patents
bronzeMedal1 out of 1 
 
Revara, Incorporated
 patent
4. 1 out of 834,513 
Other
 patents

Years Active: 1997-2026

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Areas of Expertise:
X-ray Emitting Target
Scatterometry
Secondary Ion Mass Spectrometry
Photoelectron Spectroscopy
Non-destructive Profiling
Layer Thickness
Data Analysis Techniques
Focused Ion Beam
27 patents (USPTO):Explore Patents
1. 12749642 - Patterned X-ray emitting target (2026-09-29),
2. 12360063 - System and method for measuring a sample by x-ray reflectance scatterometry (2025-07-15),
3. 12165863 - Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry (2024-12-10),
4. 11996259 - Patterned x-ray emitting target (2024-05-28),
5. 11764050 - Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry (2023-09-19),
6. 11430647 - Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (2022-08-30),
7. 10910208 - Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry (2021-02-02),
8. 10859519 - Methods and systems for measuring periodic structures using multi-angle x-ray reflectance scatterometry (XRS) (2020-12-08),
9. 10636644 - Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry (2020-04-28),
10. 10481112 - Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) (2019-11-19),
11. 10403489 - Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry (2019-09-03),
12. 10119925 - Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) (2018-11-06),
13. 10056242 - Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry (2018-08-21),
14. 9588066 - Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) (2017-03-07),
15. 9297771 - Methods and systems for fabricating platelets of a monochromator for X-ray photoelectron spectroscopy (2016-03-29),

Title: Bruno W. Schueler: Innovator in Semiconductor Metrology

Introduction

Bruno W. Schueler is an accomplished inventor based in San Jose, California, with a notable portfolio of 25 patents. His contributions primarily span the field of semiconductor metrology and surface analysis, where he has developed innovative solutions integral to the industry's advancement.

Latest Patents

Among his latest patents, Schueler has introduced systems and approaches for semiconductor metrology utilizing secondary ion mass spectrometry (SIMS). This technology features a sophisticated SIMS system that includes a sample stage, where a primary ion beam is directed. It also incorporates an extraction lens designed to create a low extraction field for secondary ions emitted from the sample. Additionally, a magnetic sector spectrograph is connected to the extraction lens along the SIMS system's optical path, consisting of an electrostatic analyzer (ESA) paired with a magnetic sector analyzer (MSA).

Another significant patent by Schueler involves improved patterned X-ray emitting targets. This innovation provides a new class of X-ray sources and systems, including X-ray reflectance scatterometry (XRS), X-ray photoelectron spectroscopy (XPS), and X-ray fluorescence (XRF) systems utilizing these advanced targets.

Career Highlights

Throughout his career, Bruno W. Schueler has worked with prominent companies such as Revera, Incorporated and Nova Measuring Instruments Ltd., where he played a crucial role in driving innovation in the semiconductor field. His expertise and inventive spirit have significantly contributed to the development of advanced metrology and analysis systems.

Collaborations

Schueler has collaborated with notable professionals in his field, including David Allen Reed and Rodney C. Smedt. These partnerships have helped foster a creative environment that promotes innovation and the further advancement of semiconductor technologies.

Conclusion

Bruno W. Schueler stands out as a key innovator in semiconductor metrology, with a robust patent portfolio that highlights his commitment to technological advancement. His inventive solutions in semiconductor analysis and X-ray technologies not only enhance industrial capabilities but also pave the way for future innovations in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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