The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2024
Filed:
Oct. 22, 2020
Applicant:
Nova Measuring Instruments Inc., Santa Clara, CA (US);
Inventors:
David A. Reed, Belmont, CA (US);
Bruce H. Newcome, Sunnyvale, CA (US);
Bruno W. Schueler, San Jose, CA (US);
Assignee:
NOVA MEASURING INSTRUMENTS INC., Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 35/08 (2006.01); G01N 23/20008 (2018.01); G01N 23/207 (2018.01); G01N 23/2208 (2018.01); G01N 23/223 (2006.01); H01J 35/24 (2006.01);
U.S. Cl.
CPC ...
H01J 35/112 (2019.05); G01N 23/20008 (2013.01); G01N 23/207 (2013.01); G01N 23/2208 (2013.01); G01N 23/223 (2013.01); H01J 35/24 (2013.01); G01N 2223/045 (2013.01); G01N 2223/052 (2013.01); G01N 2223/056 (2013.01); G01N 2223/072 (2013.01); G01N 2223/076 (2013.01); G01N 2223/085 (2013.01); G01N 2223/1016 (2013.01); G01N 2223/204 (2013.01); G01N 2223/611 (2013.01); H01J 2235/081 (2013.01); H01J 2235/084 (2013.01); H01J 2235/086 (2013.01); H01J 2235/1204 (2013.01); H01J 2235/1291 (2013.01);
Abstract
The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluorescence (XRF) systems which employ such X-ray emitting targets.