San Jose, CA, United States of America

Wei Ti Lee

USPTO Granted Patents = 37 

 

Average Co-Inventor Count = 3.7

ph-index = 8

Forward Citations = 411(Granted Patents)


Location History:

  • San Jose, CA (US) (2003 - 2024)
  • Freemont, CA (US) (2024)

Company Filing History:


Years Active: 2003-2025

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37 patents (USPTO):

Sure, I can help you with that. Here is the article about inventor Wei Ti Lee:

Title: Innovator Spotlight: Wei Ti Lee - Revolutionizing Thin Film Metrology in San Jose

Introduction:

Wei Ti Lee, a brilliant inventor based in San Jose, CA, has made significant contributions to the field of thin film metrology with his groundbreaking patents and inventions.

Latest Patents:

Wei Ti Lee's latest patents include a "Method and system for non-destructive metrology of thin layers" and "Feed-forward of multi-layer and multi-process information using XPS and XRF technologies." These patents revolutionize the monitoring and characterization of multi-layer structures in integrated circuits using advanced optical, XPS, and XRF measurements.

Career Highlights:

With an impressive portfolio of 32 patents, Wei Ti Lee has cemented his reputation as a pioneering innovator in the tech industry. He has previously worked at renowned companies like Applied Materials, Inc. and Nova Measuring Instruments Ltd., where he honed his expertise in thin film characterization and metrology.

Collaborations:

Throughout his career, Wei Ti Lee has collaborated with industry experts like Ted Tie Guo and Heath A Pois to push the boundaries of thin film metrology. These collaborations have led to the development of cutting-edge technologies that have revolutionized the semiconductor industry.

Conclusion:

In conclusion, Wei Ti Lee's innovative work in thin film metrology has had a profound impact on the tech industry. His dedication to advancing metrology techniques and his collaborative spirit have solidified his position as a leading inventor in San Jose, CA.

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