The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2025
Filed:
May. 16, 2024
Nova Measuring Instruments Inc., Freemont, CA (US);
Heath Pois, Fremont, CA (US);
Wei Ti Lee, Freemont, CA (US);
Laxmi Warad, Freemont, CA (US);
Dmitry Kislitsyn, Fremont, CA (US);
Parker Lund, Sunnyvale, CA (US);
Benny Tseng, Hsinchu, TW;
James Chen, Hsinchu, TW;
Saurabh Singh, Freemont, CA (US);
NOVA MEASURING INSTRUMENTS INC., Fremont, CA (US);
Abstract
A system to characterize a film layer within a measurement box is disclosed. The system obtains a first mixing fraction corresponding to a first X-ray beam, the mixing fraction represents a fraction of the first X-ray beam inside a measurement box of a wafer sample, the measurement box represents a bore structure disposed over a substrate and having a film layer disposed inside the bore structure. The system obtains a contribution value for the measurement box corresponding to the first X-ray beam, the contribution value representing a species signal outside the measurement box that contributes to a same species signal inside the measurement box. The system obtains a first measurement detection signal corresponding to a measurement of the measurement box using the first X-ray beam. The system determines a measurement value of the film layer based on the first measurement detection signal, the contribution value, and the first mixing fraction.