Company Filing History:
Years Active: 2024-2025
Title: Parker Lund: Innovator in Measurement Technology
Introduction
Parker Lund is a notable inventor based in Sunnyvale, California. He has made significant contributions to the field of measurement technology, particularly in the characterization of film layers using advanced X-ray techniques. With two patents to his name, Lund's work is at the forefront of innovation in this specialized area.
Latest Patents
Lund's latest patents focus on a system for characterizing and measuring film layers within a measurement box using X-ray photoelectron spectroscopy (XPS). This system is designed to obtain a first mixing fraction corresponding to a first X-ray beam, which represents the fraction of the beam inside a measurement box of a wafer sample. The measurement box is a bore structure over a substrate that contains a film layer. The system also calculates a contribution value for the measurement box, which represents a species signal outside the box that contributes to the same species signal inside. Furthermore, it obtains a first measurement detection signal corresponding to the measurement of the box using the first X-ray beam. Ultimately, the system determines a measurement value of the film layer based on the detection signal, contribution value, and mixing fraction.
Career Highlights
Parker Lund is currently employed at Nova Measuring Instruments Ltd., a company known for its innovative solutions in measurement technology. His work at Nova has allowed him to develop and refine his patented systems, contributing to advancements in the industry.
Collaborations
Lund collaborates with talented individuals such as Heath A Pois and Wei Ti Lee, who share his passion for innovation and measurement technology. Their combined expertise enhances the development of cutting-edge solutions in their field.
Conclusion
Parker Lund is a distinguished inventor whose work in measurement technology has led to significant advancements in the characterization of film layers. His contributions through patents and collaborations continue to shape the future of this specialized field.
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