Freemont, CA, United States of America

Laxmi Warad

USPTO Granted Patents = 3 

Average Co-Inventor Count = 5.1

ph-index = 1


Location History:

  • Milpitas, CA (US) (2023)
  • Freemont, CA (US) (2024)

Company Filing History:


Years Active: 2023-2025

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3 patents (USPTO):

Title: Laxmi Warad: Innovator in Measurement Technology

Introduction

Laxmi Warad is a notable inventor based in Fremont, California, recognized for his contributions to measurement technology. With a total of three patents to his name, Warad has made significant advancements in the field of film layer characterization.

Latest Patents

One of Warad's latest patents is titled "Characterizing and measuring in small boxes using XPS with multiple measurements." This innovative system is designed to characterize a film layer within a measurement box. The system utilizes a first mixing fraction corresponding to a first X-ray beam, which represents a fraction of the beam inside a measurement box of a wafer sample. The measurement box is a bore structure over a substrate containing a film layer. The system also calculates a contribution value for the measurement box, which represents a species signal outside the box that contributes to the same species signal inside. Furthermore, it obtains a first measurement detection signal corresponding to the measurement of the box using the first X-ray beam. Ultimately, the system determines a measurement value of the film layer based on the detection signal, contribution value, and mixing fraction.

Career Highlights

Laxmi Warad is currently employed at Nova Measuring Instruments Ltd., where he continues to develop innovative solutions in measurement technology. His work has been instrumental in advancing the capabilities of film layer characterization.

Collaborations

Warad collaborates with talented individuals such as Heath A. Pois and Wei Ti Lee, contributing to a dynamic work environment that fosters innovation.

Conclusion

Laxmi Warad's contributions to measurement technology through his patents and collaborations highlight his role as a significant innovator in the field. His work continues to influence advancements in film layer characterization and measurement systems.

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