Saurabh Singh

Title: Saurabh Singh: Innovator in Measurement Technology

Introduction

Saurabh Singh is a notable inventor based in Fremont, California. He has made significant contributions to the field of measurement technology, particularly in the characterization of film layers using advanced X-ray techniques. With two patents to his name, Singh continues to push the boundaries of innovation in his field.

Latest Patents

Singh's latest patents focus on a system for characterizing and measuring film layers within a measurement box using X-ray photoelectron spectroscopy (XPS). This system is designed to obtain a first mixing fraction corresponding to a first X-ray beam, which represents the fraction of the beam inside a measurement box of a wafer sample. The measurement box is a bore structure over a substrate that contains a film layer. The system also calculates a contribution value for the measurement box, which represents a species signal outside the box that contributes to the same species signal inside. Furthermore, it obtains a first measurement detection signal corresponding to the measurement of the box using the first X-ray beam. Ultimately, the system determines a measurement value of the film layer based on the detection signal, contribution value, and mixing fraction.

Career Highlights

Saurabh Singh is currently employed at Nova Measuring Instruments Ltd., where he applies his expertise in measurement technology. His work has been instrumental in advancing the capabilities of measurement systems used in various applications.

Collaborations

Singh has collaborated with notable colleagues, including Heath A. Pois and Wei Ti Lee, contributing to a dynamic and innovative work environment.

Conclusion

Saurabh Singh's contributions to measurement technology through his patents and collaborations highlight his role as a significant innovator in the field. His work continues to influence advancements in the characterization of film layers, showcasing the importance of innovation in technology.