Benny Tseng

Title: Benny Tseng: Innovator in Measurement Technology

Introduction

Benny Tseng is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of measurement technology, particularly in the characterization of film layers using advanced X-ray techniques. His work has led to the development of innovative systems that enhance measurement accuracy and efficiency.

Latest Patents

Benny Tseng holds 2 patents that focus on characterizing and measuring film layers within measurement boxes. One of his latest patents describes a system that characterizes a film layer within a measurement box. This system utilizes a first X-ray beam to obtain a mixing fraction that represents the fraction of the beam inside the measurement box of a wafer sample. The system also calculates a contribution value for the measurement box, which represents a species signal outside the box that contributes to the same species signal inside. Furthermore, it obtains a measurement detection signal corresponding to the measurement of the box using the first X-ray beam. Ultimately, the system determines a measurement value of the film layer based on the detection signal, contribution value, and mixing fraction.

Career Highlights

Benny Tseng is currently employed at Nova Measuring Instruments Ltd., where he continues to innovate in the field of measurement technology. His work has been instrumental in advancing the capabilities of measurement systems used in various applications.

Collaborations

Benny has collaborated with notable colleagues, including Heath A Pois and Wei Ti Lee, who have contributed to his research and development efforts.

Conclusion

Benny Tseng is a prominent inventor whose work in measurement technology has led to significant advancements in the characterization of film layers. His innovative patents and contributions to Nova Measuring Instruments Ltd. highlight his impact on the industry.