The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2020
Filed:
Mar. 12, 2019
Applicant:
Nova Measuring Instruments, Inc., Santa Clara, CA (US);
Inventors:
Charles Thomas Larson, Belmont, CA (US);
Kavita Shah, Mountain View, CA (US);
Wei Ti Lee, San Jose, CA (US);
Assignee:
NOVA MEASURING INSTRUMENTS, INC., Santa Clara, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/2273 (2018.01); H01L 21/67 (2006.01); C23C 16/52 (2006.01); C23C 16/24 (2006.01); C23C 16/455 (2006.01); C23C 16/06 (2006.01);
U.S. Cl.
CPC ...
G01N 23/2273 (2013.01); C23C 16/06 (2013.01); C23C 16/24 (2013.01); C23C 16/45529 (2013.01); C23C 16/52 (2013.01); H01L 21/67253 (2013.01);
Abstract
XPS spectra are used to analyze and monitor various steps in the selective deposition process. A goodness of passivation value is derived to analyze and quantify the quality of the passivation step. A selectivity figure of merit value is derived to analyze and quantify the selectivity of the deposition process, especially for selective deposition in the presence of passivation. A ratio of the selectivity figure of merit to maximum selectivity value can also be used to characterize and monitor the deposition process.