Company Filing History:
Years Active: 2012-2017
Title: Inventor Profile: Ying-Tsung Chen
Introduction
Ying-Tsung Chen, an innovative inventor based in Kaohsiung, Taiwan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 16 patents, his work focuses on enhancing the performance and manufacturing processes of semiconductor devices.
Latest Patents
Among his latest patents, two notable innovations stand out. The first, titled "Method for Forming Semiconductor Device," outlines a comprehensive method for creating a semiconductor device that involves providing a substrate with a transistor, forming a dielectric layer, and utilizing a mask layer with a slot-cut pattern for efficient connectivity.
The second patent, "Oxygen Treatment of Replacement Work-Function Metals in CMOS Transistor Gates," describes a sophisticated method of manufacturing a metal gate, incorporating a multi-layered stack structure with an ambient treatment to improve the performance of gate dielectric layers in CMOS transistors.
Career Highlights
Ying-Tsung Chen is currently employed at United Microelectronics Corporation, where he applies his expertise in semiconductor technology to drive innovation and improve manufacturing techniques. His patents reflect a deep understanding of the complexities involved in semiconductor design and production.
Collaborations
Throughout his career, Chen has collaborated with talented professionals, including his coworkers Shih-Hung Tsai and Ssu-I Fu. These collaborations have contributed to his success and the advancement of technologies within the semiconductor industry.
Conclusion
Ying-Tsung Chen's innovative contributions to semiconductor technology, evidenced by his extensive patent portfolio, highlight his role as a forward-thinking inventor in the field. His work continues to influence the development of advanced semiconductor devices, showcasing the importance of innovation in technology.