Xiaochun Li

USPTO Granted Patents = 17 (Patent Applications = 5)

Average Co-Inventor Count = 4.6

ph-index = 3

Forward Citations = 35(Granted Patents)

Location History:

Milpitas, CA (US) (2022)
San Jose, CA (US) (2012 - 2023)

Company Filing History:

Kla Tencor Corporation

patents

where one patent can have more than one assignee

Years Active: 2012-2025

where 'Filed Patents' based on already Granted Patents

17 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12482091 - Detecting defects on specimens (2025-11-25),

2. 12190500 - Detecting defects on specimens (2025-01-07),

3. 12190498 - Print check repeater defect detection (2025-01-07),

4. 12165306 - Segmentation of design care areas with a rendered design image (2024-12-10),

5. 11803960 - Optical image contrast metric for optical target search (2023-10-31),

6. 11783470 - Design-assisted inspection for DRAM and 3D NAND devices (2023-10-10),

7. 11748872 - Setting up inspection of a specimen (2023-09-05),

8. 11431976 - System and method for inspection using tensor decomposition and singular value decomposition (2022-08-30),

9. 11328435 - Image alignment setup for specimens with intra- and inter-specimen variations using unsupervised learning and adaptive database generation methods (2022-05-10),

10. 11328411 - Print check repeater defect detection (2022-05-10),

11. 11308606 - Design-assisted inspection for DRAM and 3D NAND devices (2022-04-19),

12. 11270430 - Wafer inspection using difference images (2022-03-08),

13. 11120546 - Unsupervised learning-based reference selection for enhanced defect inspection sensitivity (2021-09-14),

14. 11049745 - Defect-location determination using correction loop for pixel alignment (2021-06-29),

15. 10012599 - Optical die to database inspection (2018-07-03),

Title: Xiaochun Li: Innovator in Defect Detection Technologies

Introduction

Xiaochun Li is a prominent inventor based in San Jose, California, known for his innovative contributions to defect detection technologies. With a remarkable portfolio of 16 patents, his work has significantly impacted the fields of semiconductor manufacturing and inspection systems.

Latest Patents

Among his latest patents, Li has developed systems and methods for detecting defects on reticles as well as defects on various specimens. One of his notable inventions focuses on generating different stacked difference images for multiple instances of first patterned areas in different rows on a wafer. This technology is particularly beneficial for high sensitivity defect detection in extreme ultraviolet (EUV) and multi-die reticles, significantly reducing noise and enabling the identification of small repeater defects. Another patent addresses the computation of candidate reference images for defect detection, enhancing the accuracy of inspections in areas containing non-resolvable, repeating device patterns.

Career Highlights

Xiaochun Li has built a distinguished career, having worked for reputable companies such as Kla Corporation and KLA-Tencor Corporation, where he contributed significantly to advancements in semiconductor inspection technologies. His innovative ideas and solutions have laid the groundwork for enhanced defect detection methods in the industry.

Collaborations

Throughout his career, Xiaochun Li has collaborated with several talented professionals, including Sangbong Park and Bjorn Brauer. These collaborations have fostered the exchange of ideas and knowledge, driving further advancements in the field of defect detection technologies.

Conclusion

In conclusion, Xiaochun Li stands out as a leading inventor in the realm of defect detection systems. His visionary patents and fruitful collaborations have brought about significant innovations that continue to influence the semiconductor industry. As technology progresses, Li's contributions will undoubtedly pave the way for future advancements in inspection methodologies.

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