The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2023
Filed:
Jun. 22, 2021
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Huan Jin, Dublin, CA (US);
Xiaochun Li, San Jose, CA (US);
Sangbong Park, Dublin, CA (US);
Zhifeng Huang, Milpitas, CA (US);
Assignee:
KLA Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); H01L 22/12 (2013.01); G06T 2207/30148 (2013.01); G06T 2207/30168 (2013.01);
Abstract
Global and local alignment energies are used in an image contrast metric. The image contrast metric can be used to find optical targets. Some pixels from a gradient magnitude image and a context range image from an optical image can be used to determine the image contrast metric. A heatmap from the image contrast metrics across part of a wafer can then be used to make a list of targets. Upper and lower confidence values can be applied to rank the available targets.