The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2025

Filed:

Mar. 05, 2023
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Chunwei Song, Shanghai, CN;

Siqing Nie, Shanghai, CN;

Weifeng Zhou, Shanghai, CN;

Xiaochun Li, San Jose, CA (US);

Sangbong Park, Danville, CA (US);

Assignee:

KLA Corp., Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06V 10/74 (2022.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06V 10/74 (2022.01); G06T 2207/10024 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/20224 (2013.01); G06T 2207/30148 (2013.01);
Abstract

Methods and systems for detecting defects on a specimen are provided. One system computes different candidate reference images from different combinations of images of the specimen generated by an inspection subsystem and combines different portions of the candidate reference images without modification to thereby generate a final reference image. The final reference image is then used for defect detection, which may be single or double detection. The embodiments are particularly useful for defect detection in areas of specimens including only non-resolvable, repeating device patterns, like cell regions, but may be used for inspection of other types of areas as well.


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