Shanghai, China

Siqing Nie

USPTO Granted Patents = 3 

Average Co-Inventor Count = 4.6

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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3 patents (USPTO):Explore Patents

Title: Siqing Nie: Innovator in Defect Detection Technologies

Introduction

Siqing Nie is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of defect detection technologies, holding a total of 3 patents. His work focuses on improving the accuracy and efficiency of defect detection in semiconductor devices.

Latest Patents

One of Siqing Nie's latest patents involves methods and systems for detecting defects on specimens. This innovative system computes different candidate reference images from various combinations of images generated by an inspection subsystem. It combines different portions of these candidate reference images without modification to create a final reference image. This final reference image is then utilized for defect detection, which can be either single or double detection. The embodiments of this patent are particularly useful for detecting defects in areas of specimens that include non-resolvable, repeating device patterns, such as cell regions. However, the methods may also be applied to the inspection of other types of areas.

Another notable patent by Siqing Nie focuses on the segmentation of design care areas using a rendered design image. In this process, a rendered image is generated from a semiconductor device design file. The rendered image is then segmented based on its grey level, allowing for the determination of care areas. Defect inspection is subsequently performed in these care areas, which can be executed on a wafer inspection tool utilizing photon optics or electron beam optics.

Career Highlights

Siqing Nie is currently employed at Kla Corporation, a leading company in the semiconductor inspection and metrology industry. His work at Kla Corporation has allowed him to develop and refine his innovative technologies, contributing to advancements in defect detection.

Collaborations

Siqing Nie has collaborated with notable coworkers, including Chunwei Song and Zhuang Liu. Their combined expertise has further enhanced the development of cutting-edge technologies in the field.

Conclusion

Siqing Nie's contributions to defect detection technologies have made a significant impact in the semiconductor industry. His innovative patents and work at Kla Corporation demonstrate his commitment to advancing technology and improving inspection processes.

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