The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2022

Filed:

May. 28, 2021
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Bjorn Brauer, Beaverton, OR (US);

Huan Jin, Dublin, CA (US);

Xiaochun Li, San Jose, CA (US);

Assignee:

KLA Corp., Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/32 (2017.01); G06T 7/00 (2017.01); G06T 7/33 (2017.01);
U.S. Cl.
CPC ...
G06T 7/32 (2017.01); G06T 7/001 (2013.01); G06T 7/344 (2017.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01);
Abstract

Methods and systems for determining one or more alignment parameters for use in a process performed on a specimen are provided. One method includes determining measures of similarity between images generated by an imaging system for corresponding locations in each of two or more pairs of dies on a specimen and performing cluster analysis based on the determined measures of similarity to identify the images that are most similar to each other and to assign different subsets of the images that are most similar to each other to different die clusters, respectively. The method also includes separately determining one or more alignment parameters for two or more of the different die clusters. The one or more alignment parameters are used for aligning images generated by the imaging system for the specimen or another specimen to a common reference.


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