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For the Inventor, By the Inventor

Zhubei, Taiwan

Wen-Hao Liu

USPTO Granted Patents = 11

Average Co-Inventor Count = 9.6

ph-index = 3

Forward Citations = 27(Granted Patents)


Location History:

  • Zhubei, TW (2012 - 2020)
  • Hsinchu County, TW (2016 - 2020)

Company Filing History:

goldMedal11 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2012-2020

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11 patents (USPTO):Explore Patents
1. 10860774 - Methodology for pattern density optimization (2020-12-08),
2. 10747938 - Method for integrated circuit manufacturing (2020-08-18),
3. 10360339 - Method for integrated circuit manufacturing (2019-07-23),
4. 10049178 - Methodology for pattern density optimization (2018-08-14),
5. 9411924 - Methodology for pattern density optimization (2016-08-09),
6. 9262578 - Method for integrated circuit manufacturing (2016-02-16),
7. 9026957 - Method of defining an intensity selective exposure photomask (2015-05-05),
8. 8673520 - Intensity selective exposure photomask (2014-03-18),
9. 8527918 - Target-based thermal design using dummy insertion for semiconductor devices (2013-09-03),
10. 8431291 - Intensity selective exposure photomask (2013-04-30),
11. 8332797 - Parameterized dummy cell insertion for process enhancement (2012-12-11),

Title: Innovations of Wen-Hao Liu

Introduction

Wen-Hao Liu is a prominent inventor based in Zhubei, Taiwan. He has made significant contributions to the field of integrated circuit design and manufacturing. With a total of 11 patents to his name, Liu's work has had a substantial impact on the semiconductor industry.

Latest Patents

One of Liu's latest patents is titled "Methodology for Pattern Density Optimization." This patent relates to a method of data preparation that modifies a plurality of shapes in an integrated chip (IC) design. The method involves adding additional shapes to the IC design while ensuring they are separated by non-zero distances. Another notable patent is the "Method for Integrated Circuit Manufacturing." This method includes receiving an IC design layout and performing a correction process to modify the initial IC pattern based on location effects.

Career Highlights

Wen-Hao Liu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to develop innovative methodologies that enhance the efficiency and effectiveness of IC manufacturing processes.

Collaborations

Liu has collaborated with several talented individuals in his field, including Wen-Chun Huang and Ru-Gun Liu. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Wen-Hao Liu's contributions to integrated circuit design and manufacturing are noteworthy. His innovative patents and collaborations with other professionals highlight his commitment to advancing technology in the semiconductor industry.

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