The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2012
Filed:
Dec. 02, 2010
Ying-chou Cheng, Zhubei, TW;
Tsong-hua Ou, Taipei, TW;
Wen-hao Liu, Zhubei, TW;
Ru-gun Liu, Hsinchu, TW;
Wen-chun Huang, Xi-Gang Xiang, TW;
Ying-Chou Cheng, Zhubei, TW;
Tsong-Hua Ou, Taipei, TW;
Wen-Hao Liu, Zhubei, TW;
Ru-Gun Liu, Hsinchu, TW;
Wen-Chun Huang, Xi-Gang Xiang, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
The present disclosure relates to parameterized dummy cell insertion for process enhancement and methods for fabricating the same. In accordance with one or more embodiments, methods include providing an integrated circuit (IC) design layout with defined pixel-units, simulating thermal effect to the IC design layout including each pixel-unit, generating a thermal effect map of the IC design layout including each pixel-unit, determining a target absorption value for the IC design layout, and performing thermal dummy cell insertion to each pixel-unit of the IC design layout based on the determined target absorption value.