Wen-Chun Huang

USPTO Granted Patents = 94 (Patent Applications = 1)

Average Co-Inventor Count = 6.6

ph-index = 19

Forward Citations = 1,134(Granted Patents)

Forward Citations (Not Self Cited) = 1,066(Oct 12, 2025)

Inventors with similar research interests:

Location History:

Jhongli, TW (2015)
Xi-Gang Village, TW (2015)
Xi-Gang Xiang, TW (2011 - 2016)
Tainan County, TW (2012 - 2016)
Tainan, TW (2012 - 2023)
Hsinchu, TW (2016 - 2024)

Company Filing History:

92 out of 40,635

Taiwan Semiconductor Manufacturing Comp. Ltd.

patents

1 out of 5

Haynes and Boone, Llp

4. 1 out of 832,680

Other

patents

where one patent can have more than one assignee

Years Active: 2011-2025

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94 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12438000 - Methods for integrated circuit design and fabrication (2025-10-07),

2. 12159092 - Method for coloring circuit layout and system for performing the same (2024-12-03),

3. 12080614 - Lidded semiconductor package (2024-09-03),

4. 11790145 - Method for coloring circuit layout and system for performing the same (2023-10-17),

5. 11392742 - Method for coloring circuit layout and system for performing the same (2022-07-19),

6. 11308256 - Method of post optical proximity correction (OPC) printing verification by machine learning (2022-04-19),

7. 11048161 - Optical proximity correction methodology using pattern classification for target placement (2021-06-29),

8. 10930505 - Methods for integrated circuit design and fabrication (2021-02-23),

9. 10860774 - Methodology for pattern density optimization (2020-12-08),

10. 10817635 - Multiple patterning method for semiconductor devices (2020-10-27),

11. 10796055 - Method for coloring circuit layout and system for performing the same (2020-10-06),

12. 10747938 - Method for integrated circuit manufacturing (2020-08-18),

13. 10691864 - Method of post optical proximity correction (OPC) printing verification by machine learning (2020-06-23),

14. 10527928 - Optical proximity correction methodology using pattern classification for target placement (2020-01-07),

15. 10520829 - Optical proximity correction methodology using underlying layer information (2019-12-31),

Title: Wen-Chun Huang: Inspiring Innovations in Circuit Layouts

Introduction:

Wen-Chun Huang, a visionary inventor based in Tainan, Taiwan, is renowned for his relentless passion for innovation and excellence. With an impressive portfolio of 91 patents, he continues to inspire future generations of inventors and researchers not only in Taiwan but globally.

Latest Patents:

Among his latest patents is a groundbreaking "Method for coloring circuit layout and system for performing the same." This innovation revolutionizes the sorting and pre-coloring of nodes in G0-linked networks in multiple-patterning technology (MPT)-compliant layout designs. By utilizing a coordinate-based method, Huang's invention ensures that immediately adjacent linked nodes in a network have different features, enhancing efficiency in circuit layout design.

Career Highlights:

Having worked in prestigious companies like Taiwan Semiconductor Manufacturing Company Limited (TSMC) and Haynes and Boone, Llp, Huang has honed his skills and expertise in the field of semiconductor technology. His relentless pursuit of excellence has led to numerous groundbreaking inventions that have significantly impacted the industry.

Collaborations:

Throughout his illustrious career, Huang has collaborated with industry experts such as Ru-Gun Liu and Ming-Hui Chih. These collaborations have not only enriched his own understanding of circuit design but have also contributed to the collective pool of knowledge in the field.

Conclusion:

In conclusion, Wen-Chun Huang's dedication to innovation and his remarkable contributions to the field of circuit layout design serve as a testament to his pioneering spirit. His inventive approach continues to inspire and shape the future of technological advancements, paving the way for a new era of innovation in Taiwan and beyond.

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