The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2013
Filed:
Oct. 25, 2011
George Liu, Shin-Chu, TW;
Kuei Shun Chen, Hsin-Chu, TW;
Chih-yang Yeh, Jhubei, TW;
Te-chih Huang, Chu-Bei, TW;
Wen-hao Liu, Zhubei, TW;
Ying-chou Cheng, Zhubei, TW;
Boren Luo, Zhubei, TW;
Tsong-hua Ou, Taipei, TW;
Yu-po Tang, Taipei, TW;
Wen-chun Huang, Xi-Gang Xiang, TW;
Ru-gun Liu, Hsinchu, TW;
Shu-chen LU, Zhudong Township, Hsinchu County, TW;
Yu Lun Liu, Beidou Township, Changhua County, TW;
Yao-ching Ku, Hsinchu, TW;
Tsai-sheng Gau, Hsin Chu, TW;
George Liu, Shin-Chu, TW;
Kuei Shun Chen, Hsin-Chu, TW;
Chih-Yang Yeh, Jhubei, TW;
Te-Chih Huang, Chu-Bei, TW;
Wen-Hao Liu, Zhubei, TW;
Ying-Chou Cheng, Zhubei, TW;
Boren Luo, Zhubei, TW;
Tsong-Hua Ou, Taipei, TW;
Yu-Po Tang, Taipei, TW;
Wen-Chun Huang, Xi-Gang Xiang, TW;
Ru-Gun Liu, Hsinchu, TW;
Shu-Chen Lu, Zhudong Township, Hsinchu County, TW;
Yu Lun Liu, Beidou Township, Changhua County, TW;
Yao-Ching Ku, Hsinchu, TW;
Tsai-Sheng Gau, Hsin Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
An intensity selective exposure photomask, also describes as a gradated photomask, is provided. The photomask includes a first region including a first array of sub-resolution features. The first region blocks a first percentage of the incident radiation. The photomask also includes a second region including a second array of sub-resolution features. The second region blocks a second percentage of the incident radiation different that the first percentage.