Jhubei, Taiwan

Chih-Yang Yeh

This inventor holds 23 USPTO granted patents, primarily in Semiconductor Manufacturing. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2011-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chih-Yang Yeh. Retrieved from https://idiyas.com/inventor/chih-yang-yeh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 65.2

Average Co-Inventor Count = 6.2

ph-index = 3

Forward Citations = 28(Granted Patents)


Location History:

  • Jhubei, JP (2014)
  • Jhubei, TW (2011 - 2021)
  • Hsinchu County, TW (2016 - 2023)

Company Filing History:


Years Active: 2011-2025

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Areas of Expertise:
Semiconductor Device
High-K Metal Gate
Film Deposition
3D Structure
Ultra Thin Film
Etching Method
Photomask
Gate Contact
Double Patterning
Intensity Selective Exposure
23 patents (USPTO):Explore Patents

Title: Innovations of Chih-Yang Yeh: A Pioneer in Semiconductor Technology

Introduction: Chih-Yang Yeh, an accomplished inventor based in Jhubei, Taiwan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 23 patents, he continues to push the boundaries of innovation within the industry. His work focuses on the development and manufacturing methods of advanced semiconductor devices, which are critical to the advancement of electronics.

Latest Patents: Among his latest patents, Chih-Yang Yeh has developed a novel semiconductor device and its manufacturing method. This method involves the formation of a semiconductor fin over a substrate and a sophisticated gate structure that comprises a first metallic layer and a second metallic layer. The first layer is a metal compound of two different elements, while the second layer is a single-element metal. An oxide layer is intricately positioned between these two layers. His other patent details a semiconductor device that includes a substrate with a semiconductor fin, a gate structure, and source/drain structures located on opposite sides of the gate structure. This innovative device features a high-k dielectric layer and two work function metal layers with distinct compositions, providing enhanced performance characteristics.

Career Highlights: Chih-Yang Yeh is affiliated with Taiwan Semiconductor Manufacturing Company Limited, a leading force in the semiconductor manufacturing industry. His career has been marked by a consistent drive to innovate, resulting in several patents that are instrumental in enhancing semiconductor device manufacturing techniques.

Collaborations: Within the dynamic environment of his workplace, Chih-Yang collaborates with esteemed colleagues, including Bao-Ru Young and Chun-Sheng Liang. Together, they contribute to groundbreaking research and development efforts, fostering a culture of creativity and discovery that aims to elevate the technological standards in the semiconductor sector.

Conclusion: Chih-Yang Yeh stands out as a prominent inventor whose contributions significantly impact semiconductor technology. His latest innovations not only reflect his expertise but also demonstrate his commitment to advancing the industry. As new technologies emerge, his work will undoubtedly continue to play a crucial role in shaping the future of electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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