The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2015
Filed:
Feb. 25, 2014
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Chia-Chu Liu, Shin-Chu, TW;
Kuei Shun Chen, Hsin-Chu, TW;
Chih-Yang Yeh, Jhubei, TW;
Te-Chih Huang, Chu-Bei, TW;
Wen-Hao Liu, Zhubei, TW;
Ying-Chou Cheng, Zhubei, TW;
Boren Luo, Zhubei, TW;
Tsong-Hua Ou, Taipei, TW;
Yu-Po Tang, Taipei, TW;
Wen-Chun Huang, Tainan County, TW;
Ru-Gun Liu, Hsinchu, TW;
Shu-Chen Lu, Zhudong Township, Hsinchu County, TW;
Yu Lun Liu, Beidou Township, Changhua County, TW;
Yao-Ching Ku, Hsinchu, TW;
Tsai-Sheng Gau, Hsin Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
An embodiment of a feed-forward method of determining a photomask pattern is provided. The method includes providing design data associated with an integrated circuit device. A thickness of a coating layer to be used in fabricating the integrated circuit device is predicted based on the design data. This prediction is used to generate a gradating pattern. A photomask is formed having the gradating pattern.